Hefei Chitherm Equipment Co., Ltd
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Vacuum Muffle Furnace Cwf80-05 Ni-Cr Heating Strip Nitrogen Hydrogen
Overview
The CWF80-05 vacuum chamber furnace is suitable for medium-temperature heat treatment of electronic products, primarily used for sintering processes of related materials in nitrogen or hydrogen atmospheres. The furnace is fully equipped with a real-time computer monitoring system, making it particularly suitable for material process testing requirements in research institutes.
Performance Parameters
Product Model: CWF80-05
Operating Temperature: 400°C
Maximum Temperature: 500°C
Effective Chamber Size: 400×400×500mm (W×H×D)
Heating Element: Ni-Cr heating strip
Processing Atmosphere: Nitrogen, Hydrogen
Cooling Method: Full water-cooled outer wall
Number of Temperature Control Points: 3
Number of Temperature Control Segments: 20 steps
Temperature Stability: ±1°C, with PID parameter self-tuning function; Temperature Accuracy: ±10°C
Temperature Uniformity: ±5°C (tested at 400°C for 1 hour in an empty furnace), with reserved inspection ports
Control Method: Touch screen + PLC centralized control
Alarm Protection: Audible and visual alarms for over-temperature, broken thermocouples, low water pressure, and insufficient vacuum level
Surface Temperature Rise: ≤35°C
Design Power: 30kW
Installed Power: Approximately 50kW
Power Supply Requirements: Capacity greater than 70kVA, 3-phase 5-wire, voltage 220/380V, frequency 50Hz
External Dimensions: 1800×2000×1800mm (W×H×D)